PEP 3510A
The PEP3510A is a dual chamber microwave downstream photoresist removal system for 200mm wafers, designed for damage-free removal of photoresist. PEP3510A uses a combination of platen and lamp wafer heating to achieve high strip rates, resulting in high throughput. The production proven PEP3510A is used for bulk photoresist removal and descum applications.
This system will be remanufactured and will perform "equivalent to new condition". It may contain refurbished assemblies.
