PEP IRIDIA
The PEP Iridia integrates production-proven technologies to offer high throughput implant strip and post-etch clean process solutions. Iridia's Directional Downstream Plasma source is comprised of a directional RF source paired with a versatile, downstream microwave source. The integrated lamp module with state-of-the-art, closed-loop wafer temperature control enables multi-temperature processing in a single chamber. Designed for aggressive fluorine and reducing chemistries, the Iridia offers unsurpassed flexibility in handling your production needs, including high dose implant strip (HDIS), Front End of Line (FEOL) cleans, and post-etch cleans for aluminum and copper interconnects.
Capability of both high and low temperatures processing in the same chamber, and multiple gas options to include H2, NH3, and H20 vapor, allows for single chamber processing over a wide range of applications.
