Concept Two Altus
This system incorporates a six station process module on the modular Concept Two Classic platform to provide high throughput, multi-station sequential deposition of tungsten CVD films utilizing tungsten hexafluoride chemistries.
The system offers state-of-the-art factory automation capabilities, process integration capabilities, and high throughput with continuous processing.
This system will be remanufactured and will perform "equivalent to new condition". It may contain refurbished assemblies.
